RLE20干涉镜增强了Vistec Lithography公司最新电子束曝光机的性能
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The VB300 tool provides the ability to load and expose piece parts as small as 5 mm through to full 300 mm wafers with corresponding mask plate substrate sizes. The tool provides rapid exposure with 50 MHz pattern generator and 20-bits resolution, has axis lengths of 330 mm x 330 mm, maximum stage velocity of 50 mm/sec, the capability of generating less than 10 nm lithography and an overall 3 sigma accuracy of To achieve the stated specification the VB300 tool includes performance improvements in a number of key areas - height stability between the column and the sample, column electronics, and yaw and roll performance of the complete system. Improving noise induced errors
Having worked successfully with Renishaw on a previous project involving RGH optical encoders, Vistec selected the RLE20 fibre optic launched laser interferometer based encoder system for integration within the VB300 tool. John Tingay, R&D Manager states “We were impressed with the Renishaw RGH optical encoder product and aware of the RLE10 laser interferometer system, although the latter wasn’t ideally suited to vacuum applications, which was necessary if it were to be incorporated into any of the current tools for both mechanical and thermal stability reasons. Overcoming vacuum issues
“We did review interferometers from other vendors, but chose the Renishaw system because of the significant reductions in installation complexity and set up time provided through the fibre optic laser launch, intrinsic optical alignment system and the ability to mount the interferometer outside the chamber without degrading system performance. Luckily for us we were made aware of the development program at a time that enabled us to influence final design, ensuring its compatibility with our requirements.” Picometre resolutionThe RLE laser interferometer system produces 1 Vpp sine and cosine signals with each 360° period representing 158 nm. To provide the high resolution required by the VB300 tool, these signals are interpolated by Renishaw’s RPI20 parallel interface to provide a least significant bit (LSB) resolution of 77.2 picometres.
Improvement in error contributionIn comparison to previous systems the initial results from the VB300 show a marked improvement in the noise related error contribution. To clarify the improvement since the introduction of the RLE20, Vistec have undertaken “beam on edge” measurements where the electron beam is parked on the edge of a metal mark and the variation in the intensity of the back-scattered Comparing the VB300 spectra to that taken from the VB6 tool it can be seen that the VB300 shows no evidence of the peak at Tingay states: “Noise measurements from the VB300 are very good, no mechanical vibrations can be seen, I expect the total noise to be about 2 nm – 3 nm with no observed contribution from the reference mirror or interferometry system.” News updatesRegister for regular news updates from Renishaw Full articleEditor downloadsImages
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